ResearchOrganic Opto-Electronic Materials Lab

Top-down approach for Nano-patterning

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Top-down methods are generally represented as conventional lithographic techniques in semiconductor industry using photo masks. Nowadays, the development of high resolution nanostructure with various shapes is required for high performance and various applications in optic and electronic devices. We are developing new lithographic techniques based on top-down approach for realization of high performance device in nanotechnology