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2012

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Chiral Nematic Fluids as Masks for Lithography
Year of publication 2012
Title of paper Chiral Nematic Fluids as Masks for Lithography
Author Hyeon Su Jeong, Yun Ho Kim, Ji Sun Lee, Jung Hyun Kim, Mohan Srinivasaro and Hee-tae Jung
Publication in journal Advanced Materials, 24, 381-384 (2012)
Status of publication published
링크
   http://onlinelibrary.wiley.com/doi/10.1002/adma.201103817/abstract [173]