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Recent progress in simple and cost-effective top-down lithography for ~10 nm scale nanopatterns: from edge lithography to secondary sputtering lithography
| Year of publication | 2020 | ||||
|---|---|---|---|---|---|
| Title of paper | Recent progress in simple and cost-effective top-down lithography for ~10 nm scale nanopatterns: from edge lithography to secondary sputtering lithography | ||||
| Author | Woo-Bin Jung, Sungwoo Jang, Soo-Yeon Cho, Hwan-Jin Jeon and Hee-Tae Jung | ||||
| Publication in journal | Advanced Materials, 32, 1907101 | ||||
| Status of publication | published | 링크 |
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KAIST 291, Daehak-ro, Yuseong-gu, Daejeon 34141 T.+82-42-350-2114
34141 대전광역시 유성구 대학로 291 한국과학기술원(KAIST) T.+82-42-350-2114
34141 대전광역시 유성구 대학로 291 한국과학기술원(KAIST) T.+82-42-350-2114
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