2012 Chiral Nematic Fluids as Masks for Lithography 본문 Author Hyeon Su Jeong, Yun Ho Kim, Ji Sun Lee, Jung Hyun Kim, Mohan Srinivasaro and Hee-tae Jung Journal Advanced Materials, 24, 381-384 (2012) Status published Year 2012 관련링크 http://onlinelibrary.wiley.com/doi/10.1002/adma.201103817/abstract 1402회 연결 검색 목록 이전글Immobilization-free Screening of Aptamers assisted by Graphene Oxide", Jee-Woong Park, Rameshwar Tatavarty 16.02.09 다음글Direct visualization of large-area graphene domains and boundaries by optical birefringency 16.02.09
