2014 10 nm scale nanopatterning on flexible substrates by secondary sputtering phenomenon and their applications in high performance, flexible and transparent conducting films
본문
- Journal
- Journal of Materials Chemistry C , 2 (18), 3527 - 3531
- Status
- published
- Year
- 2014
관련링크
- 이전글Fabrication of sub-20nm nano-gap structures through the elastomeric nano-stamp assisted secondary sputtering phenomenon 16.02.07
- 다음글Comparison of blend morphologies of the nano-patterned photoactive films via two different techniques: Thermal-assisted and solvent-assisted soft-nanoimprint lithography 16.02.07